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Tantalum(Ta) Magnetron Sputtering Deposition System-RT1000-Ta

    Buy cheap Tantalum(Ta) Magnetron Sputtering Deposition System-RT1000-Ta from wholesalers
     
    Buy cheap Tantalum(Ta) Magnetron Sputtering Deposition System-RT1000-Ta from wholesalers
    • Buy cheap Tantalum(Ta) Magnetron Sputtering Deposition System-RT1000-Ta from wholesalers
    • Buy cheap Tantalum(Ta) Magnetron Sputtering Deposition System-RT1000-Ta from wholesalers
    • Buy cheap Tantalum(Ta) Magnetron Sputtering Deposition System-RT1000-Ta from wholesalers
    • Buy cheap Tantalum(Ta) Magnetron Sputtering Deposition System-RT1000-Ta from wholesalers

    Tantalum(Ta) Magnetron Sputtering Deposition System-RT1000-Ta

    Ask Lasest Price
    Brand Name : ROYAL
    Model Number : RT1000-Ta
    Certification : CE
    Price : negotiable
    Payment Terms : L/C,T/T
    Supply Ability : 5 sets per month
    Delivery Time : 8 to 12 weeks
    • Product Details
    • Company Profile

    Tantalum(Ta) Magnetron Sputtering Deposition System-RT1000-Ta

    Magnetron Sputtering is widely used to deposit refractory metals like tantalum, titanium, tungsten, niobium, which would require very high temperatures of deposition, and precious metals: Gold and Silver and which is also used for deposition of lower melting points metals like copper, aluminum, nickle, chrome etc.

    Tantalum is most used in the electronic industry as a protective coating because of its good resistance to erosion.

    Applications of Sputtered Tantalum thin film:
    1. Microelectronics industry as the films can be reactively sputtered and thus resistivity and temperature coefficient of resistance can be controlled;

    1. Medical instruments like body implants for its highly biocompatability property;
    2. Coatings on corrosion resistant parts, such as thermowells, valve bodies, and fasteners;
    3. Sputtered tantalum can be also be used as an effective corrosion resistance barrier if the coating is continuous, defected and is adherent to the substrate is intended to protect.


    Technical Advantages

    1. A standardized trolley is applied which allows easy and safe loading/unloading of the substrate holders and work pieces in/out of the deposition chamber
    2. The system is safety interlocked to prevent incorrect operation or unsafe practices
    3. The substrate heaters are provided which mounted in the center of chamber, PID controlled thermocouple for high accuracy, to enhance the condense film’s adhesion
    4. Strong vacuum pumps configurations with Magnetically suspension molecular pump via gate valve connected to chamber; backed with Leybold’s roots pump and two stage rotary vane pump, mechanical pump.
    5. High energy ionized plasma source is applied with this system to guarantee the uniformity and density.


    Royal Technology’s standardized Tantalum sputtering deposition system:

    Main Configurations
    MODELRT1000-Ta
    TECHNOLOGY

    Pulsed DC magnetron sputtering

    Cathodic arc plating (for option, determined by coating process)

    CHAMBER MATERIALStainless Steel (S304)
    CHAMBER SIZEΦ1000*1000mm (H)
    CHAMBER TYPED shape, cylindrical chamber
    ROTATION RACK & JIG SYSTEMSatellite driving or central driving system
    POWER SUPPLIES

    DC Sputtering Power Supply: 2~4 sets
    Bias Power supply: 1 set

    Ion Source: 1 set

    DEPOSITION MATERIALTa, Ti/Cr/TiAl, Au, Ag, Cu etc.
    DEPOSITION SOURCEPlanar Sputtering Cathodes + circular arc cathodes
    CONTROLPLC(Programmable Logic Controller) + IPC
    ( manual+ auto+ semi-auto operation models)
    PUMP SYSTEMRotary Vane Pump: SV300B – 1 set (Leybold)
    Roots Pump: WAU1001 – 1 set (Leybold)
    Holding Pump: D60C – 1 set (Leybold)
    Magnetic Suspension Molecular Pump:
    MAG2200 – 2 sest (Leybold)
    GAS MASS FLOW CONTROLLER2 channels: Ar and N2
    VACUUM GAUGEInficon or Leybold
    SAFETY SYSTEMNumerous safety interlocks to protect operators and equipmen
    HEATINGHeaters: 20KW. Max. temp.: 450℃
    COOLINGIndustrial Chiller (Cold Water)
    POWER MAX.100KW (Approx.)
    AVERAGE POWER CONSUMPTION45 KW (Approx.)
    GROSS WEIGHTT (Approx.)
    FOOT PRINT( L*W*H) 4000*4000 *3600 MM
    ELECTRICAL POWER

    AC 380V/3 phases/50HZ / 5 line


    Insite:

    Built Time: 2018

    Location: China

    Please contact us for more applications and specifications.

    Quality Tantalum(Ta) Magnetron Sputtering Deposition System-RT1000-Ta for sale
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