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PVD and PECVD Hybrid Vacuum Deposition Machine-RT-Multi950

    Buy cheap PVD and PECVD Hybrid Vacuum Deposition Machine-RT-Multi950 from wholesalers
     
    Buy cheap PVD and PECVD Hybrid Vacuum Deposition Machine-RT-Multi950 from wholesalers
    • Buy cheap PVD and PECVD Hybrid Vacuum Deposition Machine-RT-Multi950 from wholesalers
    • Buy cheap PVD and PECVD Hybrid Vacuum Deposition Machine-RT-Multi950 from wholesalers
    • Buy cheap PVD and PECVD Hybrid Vacuum Deposition Machine-RT-Multi950 from wholesalers
    • Buy cheap PVD and PECVD Hybrid Vacuum Deposition Machine-RT-Multi950 from wholesalers
    • Buy cheap PVD and PECVD Hybrid Vacuum Deposition Machine-RT-Multi950 from wholesalers

    PVD and PECVD Hybrid Vacuum Deposition Machine-RT-Multi950

    Ask Lasest Price
    Brand Name : ROYAL
    Model Number : Multi950
    Certification : CE
    Price : depends on
    Payment Terms : L/C,T/T
    Supply Ability : 10 sets per month
    Delivery Time : 14~16weeks
    • Product Details
    • Company Profile

    PVD and PECVD Hybrid Vacuum Deposition Machine-RT-Multi950

    The integration of PVD and PECVD technologies in a hybrid coating machine provides a range of advantages that can lead to improved coating quality, versatility, control, efficiency, cost savings, customization, and environmental sustainability.

    The Multi950 is the milestone of advanced design coating systems for Royal Tech. Here, we grateful thanks Shanghai University students and especially Process Yigang Chen, his creative and selfless dedication are unlimited values and inspired our team.

    In year 2018, we had another project cooperation with Pressor Chen, the C-60 material deposition by
    Inductive thermal evaporation method. We heartfully thank Mr. Yimou Yang and Professor Chen's leading and instruction on every innovative project.

    Multi950 machine properties:

    Compact Footprint,
    Standard Modular Design,
    Flexible,
    Reliable,
    Octal Chamber,
    2-door structure for good access,
    PVD + PECVD processes.


    Design Features:


    1. Flexibility: Arc and sputtering cathodes, Ion source mounting flanges are standardized for flexible exchange;
    2. Versatility: can deposit variety of base metals and alloys; optical coatings, hard coatings, soft coatings, compound films and solid lubricating films on the metallic and non-metallic materials substrates.
    3. Straight forward design: 2-door structure, front & back opening for easy maintenance.

    The Multi950 machine is a customized multiple functions vacuum deposition system for R&D. With half year’s discussion with Shanghai University’s team leaded by Professor Chen, we finally confirmed the design and configurations to fulfill theirs R&D applications. This system is able to deposit transparent DLC film with PECVD process, hard coatings on tools, and optical film with sputtering cathode. Based on this pilot machine design concept, we have developed 3 other coating systems after then:
    1. Bipolar Plate Coating for Fuel Cell Electric Vehicles- FCEV1213,
    2. Ceramic Direct Plated Copper- DPC1215,
    3. Flexible Sputtering System- RTSP1215.
    These 4 models machine are all with Octal chamber, flexible and reliable performances are extensively used in various applications. It satisfy the coating processes require multi different metal layers: Al, Cr, Cu, Au, Ag, Ni, Sn, SS and many other non-feeromagnetic metals;
    plus the Ion source unit, efficiently enhance films adhesion on different substrate materials with its plasma etching performance and, the PECVD process to deposit some carbon-based layers.

    Multi950 - Technical Specifications


    DescriptionMulti-950

    Deposition chamber (mm)

    Width x Depth x Heigh

    1050 x 950 x 1350




    Deposition Sources

    1 pair of MF sputtering cathodes
    1 pair of PECVD
    8 sets arc cathodes
    Linear Ion Source1 set
    Plasma Uniformity Zone (mm)φ650 x H750
    Carousel6 x φ300




    Powers (KW)

    Bias: 1 x 36
    MF: 1 x 36
    PECVD: 1 x36
    Arc: 8 x 5
    Ion Source: 1 x 5
    Gas Control SystemMFC: 4 + 1
    Heating System500℃, with thermalcouple PID control
    High Vacuum Gate Valve2
    Turbomolecular pump2 x 2000L/S
    Roots Pump1 x 300L/S
    Rotary Vanes Pump1 x 90 m³/h + 1 x 48 m³/h
    Footprint (L x W x H ) mm3000 * 4000 * 3200
    Total Power (KW)150


    Royal Tech's service and engineering teams provide customer support onsite, contact us for your applications!


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