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Closed Field Unbalanced Magnetron Sputtering System, CE Certified PVD Ion Plating Machine

    Buy cheap Closed Field Unbalanced Magnetron Sputtering System, CE Certified PVD Ion Plating Machine from wholesalers
     
    Buy cheap Closed Field Unbalanced Magnetron Sputtering System, CE Certified PVD Ion Plating Machine from wholesalers
    • Buy cheap Closed Field Unbalanced Magnetron Sputtering System, CE Certified PVD Ion Plating Machine from wholesalers
    • Buy cheap Closed Field Unbalanced Magnetron Sputtering System, CE Certified PVD Ion Plating Machine from wholesalers
    • Buy cheap Closed Field Unbalanced Magnetron Sputtering System, CE Certified PVD Ion Plating Machine from wholesalers
    • Buy cheap Closed Field Unbalanced Magnetron Sputtering System, CE Certified PVD Ion Plating Machine from wholesalers

    Closed Field Unbalanced Magnetron Sputtering System, CE Certified PVD Ion Plating Machine

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    Brand Name : ROYAL
    Model Number : RTSP1000
    Certification : CE
    Supply Ability : 10 sets per month
    Delivery Time : 10~12 weeks
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    Closed Field Unbalanced Magnetron Sputtering System, CE Certified PVD Ion Plating Machine


    Closed field unbalanced magnetron sputtering deposition system, Unbalanced Magnetron Sputtering Ion Plating


    Unbalanced and closed field magnetron processes have all the advantages of planar magnetrons. Additional advantages and disadvantages are:

    • Additional ion bombardment resulting in dense, adherent films
    • Ion assist and substrate cleaning possible
    • Improved tribological, wear and corrosion resistant films
    • Amenable to multilayer, superlattice, nanolaminant and nanocomposite films
    • Poorer materials usage
    • More complex cathode configuration/expense

    Unbalanced and closed field magnetron sputtering revolutionized properties achievable by magnetron sputtering processes. As successful with improved thin film tribological, corrosion resistance and optical properties as this technology was, improvements in magnetron technology had just begun. Next Blog we move onto rotating and cylindrical magnetron processes and resulting thin film applications.

    --- Above Artical from P E T E R M A R T I N


    Royal technology developed high yield and high target utilization sputtering cathodes, especially for rare and expensive metals sputtering: Au Gold, Ta Tantalum, Ag silver metal films deposition. The high uniformity film's deposition system have been serving several industries like Electronics parts, medical instruments components which require high film uniformity, multiple layers deposition.


    The RTSP1000 machine is a standardized machine developed by Royal technology. Extensive applied with cutting/forming tools, molds, medical instruments, electronics components, automotive industries.


    RTSP1000 Main Configurations and Technical Parameters
    MODELRTSP1000
    TECHNOLOGYMF magnetron sputtering + ion source plasma cleaning
    CHAMBER MATERIALStainless Steel (S304)
    CHAMBER SIZEΦ1000*800mm (H)
    CHAMBER TYPED shape
    ROTATION RACK & JIG SYSTEM6 satellites Max. weight: 500kgs
    POWER SUPPLIES

    Qty. of Sputtering: 2*24 KW Bias of Power Supply: 1*20W Ion Source Power supply 1*5KW

    DEPOSITION MATERIALTi/Cr/TiAl /Ta/Cu/Au/Carbon etc.
    DEPOSITION SOURCE2 pairs (4 pieces) Planar Sputtering Cathodes +
    1 Linear Ion Source
    Uniformity Area: ±10~15%
    CONTROLPLC(Programmable Logic Controller) + Touch Screen ( manual+ auto+ semi-auto operation models)
    PUMP SYSTEMRotary Vane Pump: SV300B - 1 set (Leybold)
    Roots Pump: WAU1001- 1 set (Leybold)
    Holding Pump: D60C- 1 set (Leybold)
    Magnetic Suspension Molecular Pump - 1 set (Leybold)
    GAS MASS FLOW CONTROLLER4 channels, Made in China, Seven Star (CS series, ) digital model
    VACUUM GAUGEModel: ZDF-X-LE, Made in China: ZDF-X-LE
    LINEAR ION SOURCE1 piece Pre-treating, plasma cleaning + assisted deposition
    SAFETY SYSTEMNumerous safety interlocks to protect operators and equipment
    HEATINGHeaters: 30KW. Max. temp.: 450℃
    COOLINGIndustrial Chiller (Cold Water)
    POWER MAX.100KW (Approx.)
    AVERAGE POWER CONSUMPTION45 KW (Approx.)
    GROSS WEIGHTT (Approx.)
    FOOT PRINT( L*W*H) 4000*4000 *3200 MM
    POWER ELECTRICALAC 380V/3 phases/50HZ / 5 lines

    High target utilization planar sputtering deposition: please CLICK HERE to watch the video


    Linear Ion Source Plasma Cleaning and Assisted Deposition: please CLICK HERE to watch video



    Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.


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