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Tantalum (Ta)Thin Film Magnetron Sputtering Deposition System-RTSP1000

    Buy cheap Tantalum (Ta)Thin Film Magnetron Sputtering Deposition System-RTSP1000 from wholesalers
     
    Buy cheap Tantalum (Ta)Thin Film Magnetron Sputtering Deposition System-RTSP1000 from wholesalers
    • Buy cheap Tantalum (Ta)Thin Film Magnetron Sputtering Deposition System-RTSP1000 from wholesalers
    • Buy cheap Tantalum (Ta)Thin Film Magnetron Sputtering Deposition System-RTSP1000 from wholesalers
    • Buy cheap Tantalum (Ta)Thin Film Magnetron Sputtering Deposition System-RTSP1000 from wholesalers
    • Buy cheap Tantalum (Ta)Thin Film Magnetron Sputtering Deposition System-RTSP1000 from wholesalers

    Tantalum (Ta)Thin Film Magnetron Sputtering Deposition System-RTSP1000

    Ask Lasest Price
    Brand Name : ROYAL
    Model Number : RTSP1200
    Certification : CE
    Price : negotiable
    Payment Terms : L/C,T/T
    Supply Ability : 8 sets per month
    Delivery Time : 12~16 weeks
    • Product Details
    • Company Profile

    Tantalum (Ta)Thin Film Magnetron Sputtering Deposition System-RTSP1000

    Deposition of Tantalum, Gold precious metals by Sputtering

    Sputtering is widely used to deposit refractory metals like tantalum, titanium, tungsten, niobium, which would require very high temperatures of deposition, and precious metals: Gold and Silver and which is also used for deposition of lower melting points metals like copper, aluminum, nickle, chrome etc.

    Tantalum is most used in the electronic industry as a protective coating because of its good resistance to erosion.

    Sputtered tantalum films are widely used in the
    1. Microelectronics industry as the films can be reactively sputtered and thus resistivity and temperature coefficient of resistance can be controlled;

    2. Medical instruments like body implants for its highly biocompatability property;

    3. Coatings on corrosion resistant parts, such as thermowells, valve bodies, and fasteners;

    4. Sputtered tantalum can be also be used as an effective corrosion resistance barrier if the coating is continuous, defected and is adherent to the substrate is intended to protect.

    Royal Technologys standardized Tantalum sputtering deposition system: RTSP1000 model.
    Tantalum sputtered film properties:
    Low resistivity

    High corrosion and wear resistant coatings on surface that are subjected to high stresses and harsh chemical and erosive environment.


    Design features:

    Robust Design, Stable Quality, Fast Cycle, High Precision System


    Main Configurations

    MODEL

    RTSP1000

    TECHNOLOGY

    DC magnetron sputtering + Cathodic arc plating

    CHAMBER MATERIAL

    Stainless Steel (S304)

    CHAMBER SIZE

    Φ1000*1600mm (H)

    CHAMBER TYPE

    D shape, cylindrical chamber

    ROTATION RACK & JIG SYSTEM

    Satellite driving or central driving system

    POWER SUPPLIES

    DC Sputtering Power Supply: 2~4 sets
    Bias Power supply: 1 set

    Ion Source: 1 set

    DEPOSITION MATERIAL

    Ti/Cr/TiAl, Ta, Au, Ag, Cu etc.

    DEPOSITION SOURCE

    Planar Sputtering Cathodes + circular arc cathodes

    CONTROL

    PLC(Programmable Logic Controller) + Touch Screen
    ( manual+ auto+ semi-auto operation models)

    PUMP SYSTEM

    Rotary Vane Pump: SV300B - 1 set (Leybold)

    Roots Pump: WAU1001 - 1 set (Leybold)

    Holding Pump: D60C - 1 set (Leybold)

    Magnetic Suspension Molecular Pump:
    MAG2200 - 2 sest (Leybold)

    GAS MASS FLOW CONTROLLER

    2 channels: Ar and N2

    VACUUM GAUGE

    Inficon or Leybold

    SAFETY SYSTEM

    Numerous safety interlocks to protect operators and equipmen

    HEATING

    Heaters: 20KW. Max. temp.: 450

    COOLING

    Industrial Chiller (Cold Water)

    POWER MAX.

    100KW (Approx.)

    AVERAGE POWER CONSUMPTION

    45 KW (Approx.)

    GROSS WEIGHT

    T (Approx.)

    FOOT PRINT

    ( L*W*H) 4000*4000 *3600 MM

    ELECTRICAL POWER

    AC 380V/3 phases/50HZ / 5 line


    Equipment Structure:

    Coating System Structure: Vertical orientation, octagonal structure, 2 doors for easy access.

    Environmentally friendly system, no hazardous wastes.

    Total integration, modular design
    Commercialized and standardized for industrial mass production
    Extremely efficient ion source for strong adhesion and high ionization.
    Easy Operation: Touch screen + PLC control, one touch operation
    Special design of Carousel system for high uniformity deposition.
    High productivity and stability, working 24/7 a week.
    Flexible, matches to various sizes of plates

    Key components

    Ion source for assisted depositon process:


    Ion source for plasma iteching process:

    The RT1200-FCEV machine is a batch model sputtering system, which can deposit various hard coatings, soft coatings, compound films and solid lubricating films on the metallic and non-metallic materials substrates. Applied to industries of Hydrogen Fuel Cell vehicles, photonic products, aerospace and other new energy industries.


    Performances of the deposition films:

    To improve the conductivity of surface;

    High corrosion resistance;

    High wear resistance;

    High hardness

    Hydrophobic composition film and other functional films

    Available for compound coatings: metallic and non-metallic films.

    Film thickness range from 100nm to 12μm, thickness tolerance ±5%

    Strong adhesion.

    Low tempering parts surface hardening treatment.


    Type:

    Vertical orientation, octal structure, 2-doors (front and back)

    Design advantages:

    • Environmentally friendly system, no industrial waste water, air and noise pollution;
    • Easy Operation: Touch screen + PLC control and unique software program for one touch operation, more than 80% trouble shootings alarm.
    • Up to 10 processing recipes login and backup; high repeatability and diversity.
    • Special design of Carousel system for high uniformity of film deposition.
    • High productivity and high quality
    • Stable and reliable system, running 365 days * 24hrs (maintenance and repair breaking time)
    • Efficiency pumping system: shorter vacuum piping lines for maximum piping speed with well known European pump brands
    • Compact design occupy minimum installation space.

    Contact us for more details. Royal Tech team is honored to serve you with our best service and knowleage.

    Quality Tantalum (Ta)Thin Film Magnetron Sputtering Deposition System-RTSP1000 for sale
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